Influence of the watermark in immersion lithography processKAWAMURA, Daisuke; TAKEISHI, Tomoyuki; TOSHIMA, Takayuki et al.SPIE proceedings series. 2005, isbn 0-8194-5733-7, 2Vol, Part 2, 818-826Conference Paper

The Resist-core Spacer Patterning Process for Fabrication of 2xnm Node Semiconductor DevicesSHO, Koutarou; OORI, Tomoya; IIDA, Kazunori et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79720C.1-79720C.11, 2Conference Paper

Immersion resist process for 32nm node logic devicesEMA, Tatsuhiko; SHO, Koutarou; FUKUSHIMA, Takashi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69230E.1-69230E.12, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper